Ключевые слова: MgB2, thin films, substrates, spheres, HPCVD process, fabrication, resistive transition, levitation performance, microstructure, HTS, YBCO, bulk, comparison
Ключевые слова: MgB2, thin films, carbon, ion irradiation, irradiation effects, X-ray diffraction, critical caracteristics, upper critical fields, heat treatment, annealing process, substrate single crystal, HPCVD process, resistive transition, magnetization, critical temperature, lattice parameter, Jc/B curves, experimental results
Ключевые слова: MgB2, thin films, irradiation effects, ion irradiation, carbon, critical caracteristics, HPCVD process, substrate sapphire, X-ray diffraction, lattice parameter, resistive transition, RRR parameter, critical temperature, Jc/B curves, irreversibility fields, pinning force, fabrication, experimental results
Li M., Xi X.X., Hellstrom E., Davidson B.A., Chen K., Acharya N., Collantes Y., Kasaei L., Manichev V., Feldman L.C., Gustafsson T., Demir M., Bhattarai P.
Xi X.X., Tantawi S., Lee N., Kustom R.L., Tan T., Wolak M.A., Withanage W.K., Nassiri A., Welander P.B., Franzi M.
Ключевые слова: MgB2, films, HPCVD process, substrates, disks, Cu-based conductors, fabrication
Ключевые слова: MgB2, thin films, HPCVD process, magnetic relaxation, magnetization, flux creep
Ключевые слова: MgB2, films, fabrication, HPCVD process, microstructure, quality control
Ключевые слова: presentation, HTS, coated conductor modules, MgB2, films, HPCVD process, flux jumps, PLD process, comparison, critical caracteristics, Jc/B curves, critical current density, temperature dependence, magnetic field dependence, magnetization, optical imaging, resistivity, substrate Hastelloy, buffer layers, fabrication, experimental results
Ключевые слова: MgB2, films, substrate Hastelloy, buffer layers, PLD process, HPCVD process, fabrication, microstructure, critical caracteristics, Jc/B curves
Ключевые слова: MgB2, films large-area, HPCVD process, fabrication, microstructure, critical caracteristics, Jc/B curves, upper critical fields
Larbalestier D.C., Li Q., Zhu Y., Mielke C.H., Gurevich A., Pogrebnyakov A.V., Xi X.X., Ferrando V., Wilke R.H., Eom C., Betts J.B., Voyles P.M., Chen K., Bark C.W., Dai W., Weng X., Redwing J., Rickel D.
Ключевые слова: MgB2, doping effect, films, HPCVD process, fabrication, resistivity, temperature dependence, critical temperature, microstructure, magnetic properties, upper critical fields, anisotropy, critical caracteristics, critical current density, angular dependence, Jc/B curves, experimental results
Jun B., Kim C., Joo J.H., Dou S.X., Kim Y., Zhao Y., Jung S., Seong W.K., Kang W.N., Lee T.G., Ranot M.
Ключевые слова: MgB2, films, substrate Cu, HPCVD process, fabrication, microstructure, Jc/B curves, critical caracteristics, pinning force
Lee S., Cho J., Lee H., Xi X.X., Lee J., Choi E., Jo Y., Zhuang C.G., Feng Q.R., Gan Z.Z., Wang Y.Z.
Ключевые слова: MgB2, films, PLD process, HPCVD process, comparison, substrate sapphire, critical caracteristics, Jc/B curves, microstructure, fabrication, experimental results
Ключевые слова: MgB2, films, pinning centers, HPCVD process, fabrication, magnetic properties, susceptibility, magnetization curves, interaction
Lee C., Li Q., Xi X.X., Redwing J.M., Wang S.F., Soukiassian A., Schlom D.G., Lamborn D.R., Chen K., DeFrain R.
Ключевые слова: MgB2, films epitaxial, HPCVD process, Jc/B curves, temperature dependence, critical caracteristics, fabrication
Ключевые слова: MgB2, films thick, films epitaxial, nanowires, HPCVD process, Jc/B curves, pinning force, fabrication, critical caracteristics
Ключевые слова: MgB2, films thick, HPCVD process, fabrication
Li-Ping C., Fen L., Tao G., Cheng-Gang Z., Dan Y., Li-Li D., Kai-Cheng Z., Zi-Zhao G., Guang-Cheng X., Qing-Rong F.(qrfeng@pku.edu.cn)
Ключевые слова: MgB2, films, substrate Cu, substrate metallic, substrate stainless steel, HPCVD process, microstructure, Jc/B curves, fabrication, critical caracteristics
Ключевые слова: MgB2, films, HPCVD process, fabrication, nanoscaled effects
Ключевые слова: MgB2, films, HPCVD process, composition, fabrication, substrate sapphire, resistivity
Ключевые слова: MgB2, films thick, films epitaxial, HPCVD process, fabrication, grain boundaries, pinning, critical current density, critical caracteristics
Pogrebnyakov A.V., Xi X.X., Redwing J.M., Wilke R.H., Maertz E., Qi L., Soukiassian A., Schlom D.G., Findikoglu A.
Ключевые слова: MgB2, films, substrate flexible, mechanical properties, bending process, HPCVD process, fabrication, flexibility
Ключевые слова: MgB2, films, HPCVD process, in-situ process, fabrication
Chen J., Li Q., Mielke C.H., Pogrebnyakov A.V., Xi X.X., Redwing J.M., Ferrando V., Giencke J.E., Orgiani P., Eom C., Feng Q., Betts J.B.
Li Q., Ye Z.X., Li Q.(qiangli@bnl.gov), Hu Y.F., Pogrebnyakov A.V., Cui Y., Xi X.X., Redwing J.M.
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